Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications (Hardcover)

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications By John E. J. Schmitz Cover Image

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications (Hardcover)

Email or call for price & availability

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
Product Details ISBN: 9780815512882
ISBN-10: 0815512880
Publisher: William Andrew
Publication Date: December 31st, 1992
Pages: 251
Language: English
Series: Materials Science and Process Technology